Product Detail
ITO
ITO is transparent and colorless in thin layers. The typical In2O3 to SnO2 ratios by weight, are 90:10, 95:5, and 80:20. ITO films are most commonly deposited on surfaces by physical vapor deposition, electron beam evaporation, or a variety of sputtering techniques.
ITO is mainly used to make transparent conductive coatings for LCD, fpd, OLED, touch panel, plasma display, solar cell, antistatic coating, etc. Besides, ITO is widely used for various optical coatings for infrared-reflecting, ultraviolet-absorbing, transparency-intensifying purposes.
Our ITO products consist of powder, granule, tablet and sputtering targets.
ITO Sputtering Target
Usage
LCD transparent electricity conductive ITO film deposited by vacuum magnetic sputtering.
Chemical Formula: In2O3/SnO2
Relative Density:≥98%; 62%±2
Crystal Particle Size: 5~15μm
Electrical Resistivity: 0.12×10-3Ω·cm
Linear Thermal Expansion: 8.2×10-3K-1
Purity:≥99.99%
Appearance: Black (High Density), Green (Low Density)
Impurity (Unit: ppm)
|
Element |
Al |
Sb |
Cd |
Cu |
Fe |
Pb |
Ni |
Si |
Zn |
Ba |
|
Content |
5 |
5 |
5 |
10 |
10 |
10 |
10 |
15 |
5 |
5 |
Testing Methods
Crystal Particle Size: Observed by SEM
Purity: Tested by ICP—AES means
Density: Tested by Archimedes Means