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Product Detail

    ITO


    ITO is transparent and colorless in thin layers. The typical In2O3 to SnO2 ratios by weight, are 90:10, 95:5, and 80:20. ITO films are most commonly deposited on surfaces by physical vapor deposition, electron beam evaporation, or a variety of sputtering techniques.

    ITO is mainly used to make transparent conductive coatings for LCD, fpd, OLED, touch panel, plasma display, solar cell, antistatic coating, etc. Besides, ITO is widely used for various optical coatings for infrared-reflecting, ultraviolet-absorbing, transparency-intensifying purposes.

    Our ITO products consist of powder, granule, tablet and sputtering targets.


    ITO Sputtering Target

    Usage

    LCD transparent electricity conductive ITO film deposited by vacuum magnetic sputtering.


    Chemical Formula: In2O3/SnO2

    Relative Density:98%; 62%±2

    Crystal Particle Size: 5~15μm

    Electrical Resistivity: 0.12×10-3Ω·cm

    Linear Thermal Expansion: 8.2×10-3K-1

    Purity:99.99%

    Appearance: Black (High Density), Green (Low Density)

    Impurity (Unit: ppm)

    Element

    Al

    Sb

    Cd

    Cu

    Fe

    Pb

    Ni

    Si

    Zn

    Ba

    Content

    5

    5

    5

    10

    10

    10

    10

    15

    5

    5

    Testing Methods

    Crystal Particle Size: Observed by SEM

    Purity: Tested by ICPAES means

    Density: Tested by Archimedes Means